EXPOSURE EQUIPMENT FOR PERFORMING SIMULTANEOUSLY EXPOSING AND ALIGNING PROCESSES ON SHOT OF WAFER AND EXPOSURE METHOD USING THE SAME

摘要

PURPOSE: A bit of exposure equipment and an exposure method using the same are provided to perform simultaneously an exposure and an alignment on a shot of a wafer without a regular correction term by forming a plurality of first align marks on a reticle and a plurality of second align marks on the shot corresponding to the first align marks. CONSTITUTION: A bit of exposure equipment includes a wafer stage, a reticle, a light source, and a lens unit. The wafer stage(150) loads a wafer(140). The reticle(130) is installed over the wafer. The reticle includes a predetermined pattern(131). The light source(110) irradiates a ray of light. The lens unit(120) transmits the light to a shot(141) of the wafer via the reticle. A plurality of first align marks(132) are formed on the predetermined pattern of the reticle. A plurality of second align marks(142) are formed on the shot of the wafer corresponding to the first align marks, respectively.