| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a novel polymer or a copolymer giving a chemically amplifying positive type resist composition excellent in high transparency to an ArF excimer laser light, sensitivity, a resist pattern form, dry etching-proof properties and adhesiveness, and a novel compound useful as its monomer. <P>SOLUTION: Compounds of 2-hydroxy-3-pinanone acrylate or methacrylate are shown by formula (1) wherein R<SP>1</SP>represents hydrogen atom or methyl group; R<SP>2</SP>, R<SP>3</SP>and R<SP>4</SP>represent each hydrogen atom or a lower alkyl group. The polymer or copolymer contains a structural unit shown by formula (2). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
