| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method of which the facility cost and environmental cost can be reduced, in which a substrate to be cleaned is not destroyed electrically, and by which the substrate can be cleaned regardless of the electrical characteristics, i.e. whether the substrate is conductive or dielectric. SOLUTION: The cleaning method of removing contaminants on the surface of a substrate includes a step for generating cleaning active species from ions, hydrogen peroxide or oxygen by applying an electric field to a solution containing hydrogen peroxide or oxygen, and a step for cleaning the surface of the substrate by feeding a solution containing the cleaning active species thereto. COPYRIGHT: (C)2005,JPO&NCIPI
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