SUBSTRATE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To bring the lower surface of a cover into contact with a processing solution so as to be preventable a substrate from being contaminated by the processing solution condensed on the cover. SOLUTION: The cover 9 covering the upper part of a processing tank 3 in a freely openable manner is arranged at a level so as to bring its lower surface into contact with the liquid level of a processing solution reserved in the inner tank 3a when the upper part of the tank 3 is closed by the cover 9, so that the lower surface of the cover 9 is kept always in contact with the processing solution. Therefore, the processing solution containing chemicals are hardly condensed on the lower surface of the cover 9, so that the substrate can be prevented from being contaminated by the processing solution condensed on the cover 9. COPYRIGHT: (C)2005,JPO&NCIPI