发明名称 |
Thin film transistor substrate and method of manufacturing the same |
摘要 |
Lest gate lead lines 122 which are readily corrodable in atmosphere should be exposed on the cutting surface formed at the time of separating an inner display area, which includes gate and drain terminals, in an eventual TFT substrate 100 from static electricity protection lead lines 4 and static electricity protection elements 19, gate terminal electrodes 115 which is formed from corrosion-resistant ITO are cut apart in the vicinity of the gate and drain terminals 3 and 8.
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申请公布号 |
US2004238888(A1) |
申请公布日期 |
2004.12.02 |
申请号 |
US20040856401 |
申请日期 |
2004.05.28 |
申请人 |
YASUDA KYOUNEI;TANAKA HIROAKI |
发明人 |
YASUDA KYOUNEI;TANAKA HIROAKI |
分类号 |
G02F1/1343;G02F1/1345;G02F1/1362;G02F1/1368;H01L21/3205;H01L23/52;H01L29/786;(IPC1-7):G02F1/133 |
主分类号 |
G02F1/1343 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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