PATTERN DEFECT INSPECTION DEVICE AND IMAGE SENSOR CALIBRATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a pattern defect inspection device for acquiring sensitivity correction data for an image sensor without lowering the processing capacity of the inspection device, and having high sensitivity and high stability owing to automatic correction by lot or by wafer. SOLUTION: Correction characteristics are acquired by using a mirror piece for sensitivity calibration for the image sensor provided on a moving stage for handling an object under inspection. Each of a plurality of imaging elements of the image sensor is corrected based on the correction characteristics when loading/unloading the object. COPYRIGHT: (C)2005,JPO&NCIPI