| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive element which suppresses filiform undeveloped parts (deficiency of resolution) which occurs in a part where the interval between resist patterns is narrow while maintaining superior resolution, and can form a resist pattern whose side face shape is good. <P>SOLUTION: The photosensitive element has on a resin film a photosensitive layer comprising a photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond and (C) a photopolymerization initiator, wherein the component (A) includes a low molecular weight binder polymer whose weight average molecular weight is 10,000 to 30,000 and the resin film has a haze of ≤1%. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
