发明名称 METHOD FOR MEASURING SURFACE PROFILE AND/OR FILM THICKNESS, AND ITS APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a surface profile and/or film thickness measuring method and its apparatus for precisely measuring the profile of the surface in a rugged state etc. of a measuring object or measuring object the surface of which is covered with a transparent film. SOLUTION: By changing a distance of the measuring object surface, radiating white light from a white light source onto a reference surface and the measuring object surface or measuring object surface covered with a transparent film, an optical path difference between beams of reflected light by the measuring object surface and the reference surface is produced, and the intensity values of their interference light under these conditions are sampled at predetermined intervals. A physical model function is formed based on a group of the obtained intensity values. This function is adjusted to the group of the intensity values, and when they coincide approximately information on a peak position of the function is found. From the information on this found peak position, at least one out of the height of the surface of the transparent film at a specific spot, the height of the surface of the measuring object, and the thickness of the transparent film is found. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004340680(A) 申请公布日期 2004.12.02
申请号 JP20030136136 申请日期 2003.05.14
申请人 TORAY ENG CO LTD;RIKOGAKU SHINKOKAI 发明人 OGAWA EIKO;KITAGAWA KATSUICHI;SUGIYAMA SUSUMU;SHIMOYAMA KENICHI
分类号 G01B11/02;G01B11/24;H01L21/66;(IPC1-7):G01B11/24 主分类号 G01B11/02
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