发明名称 |
Silicon-containing polymer, resist composition and patterning process |
摘要 |
Novel silicon-containing polymers are provided comprising recurring units having a POSS pendant and units which improve alkali solubility under the action of an acid. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of up to 300 nm and improved resistance to oxygen plasma etching.
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申请公布号 |
US2004242821(A1) |
申请公布日期 |
2004.12.02 |
申请号 |
US20040853783 |
申请日期 |
2004.05.26 |
申请人 |
HATAKEYAMA JUN;TAKEDA TAKANOBU |
发明人 |
HATAKEYAMA JUN;TAKEDA TAKANOBU |
分类号 |
C08G77/14;C08F30/08;C08F230/08;C08G77/04;G03F7/039;G03F7/075;H01L21/027;(IPC1-7):G03F7/004;C08F122/04;C08F222/04 |
主分类号 |
C08G77/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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