发明名称 DEVELOPMENT ENHANCEMENT OF RADIATION-SENSITIVE ELEMENTS
摘要 A positive-working radiation-sensitive composition for use with a radiation source comprises one or more polivinyl acetal polymers capable of being dissolved in an alkaline acqueous solution and a development-enhancing compound. The sensitivity of a radiation-sensitive coating based on the composition of this invention is increased without compromising the handling characteristics. Radiation-sensitive elements based on the composition of the invention have good development latitude. A positive-working lithographic printing precursor is based on the radiation-sensitive composition coated on a hydrophilic surface. The precursor is developable using an alkaline aqueous solution, and may be used with a radiation source in lithographic applications, such as conventional imaging systems, computer-to-plate systems or other direct imaging applications. The precursor is stable in its state before exposure and has an excellent handling property.
申请公布号 WO2004081662(A3) 申请公布日期 2004.12.02
申请号 WO2004CA00381 申请日期 2004.03.12
申请人 CREO INC.;MEMETEA, LIVIA, T.;JARAMILLO, JUANA, G.;BRADFORD, NICHOLAS;GOODIN, JONATHAN, W.;YANG, CHENG;LEVANON, MOSHE 发明人 MEMETEA, LIVIA, T.;JARAMILLO, JUANA, G.;BRADFORD, NICHOLAS;GOODIN, JONATHAN, W.;YANG, CHENG;LEVANON, MOSHE
分类号 B41C1/10;B41M5/36;G03F;G03F7/004 主分类号 B41C1/10
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