发明名称 NON-VOLATILE MEMORY CELL WITH INCREASE COUPLING RATIO BETWEEN CONTROL GATE AND FLOATING GATE AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A non-volatile memory cell and a manufacturing method thereof are provided to increase a coupling ratio between a control gate and a floating gate without the increase of height of the floating gate by forming partially the floating gate in a trench of an isolation layer. CONSTITUTION: An isolation layer(150a) for defining an active region(150) is formed in a semiconductor substrate(100). A trench is formed in the isolation layer. A floating gate(550) covers the active region and a sidewall of the trench adjacent to the active region. A control gate(750) covers the floating gate and crosses the active region. A tunnel insulating layer(200a) is formed between the floating gate and the active region. A inter-gate insulating layer(600) is formed between the control gate and the floating gate.
申请公布号 KR20040100688(A) 申请公布日期 2004.12.02
申请号 KR20030033108 申请日期 2003.05.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, SEUNG MIN
分类号 H01L27/115;(IPC1-7):H01L27/115 主分类号 H01L27/115
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