发明名称 |
NON-VOLATILE MEMORY CELL WITH INCREASE COUPLING RATIO BETWEEN CONTROL GATE AND FLOATING GATE AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A non-volatile memory cell and a manufacturing method thereof are provided to increase a coupling ratio between a control gate and a floating gate without the increase of height of the floating gate by forming partially the floating gate in a trench of an isolation layer. CONSTITUTION: An isolation layer(150a) for defining an active region(150) is formed in a semiconductor substrate(100). A trench is formed in the isolation layer. A floating gate(550) covers the active region and a sidewall of the trench adjacent to the active region. A control gate(750) covers the floating gate and crosses the active region. A tunnel insulating layer(200a) is formed between the floating gate and the active region. A inter-gate insulating layer(600) is formed between the control gate and the floating gate.
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申请公布号 |
KR20040100688(A) |
申请公布日期 |
2004.12.02 |
申请号 |
KR20030033108 |
申请日期 |
2003.05.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, SEUNG MIN |
分类号 |
H01L27/115;(IPC1-7):H01L27/115 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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