| 摘要 |
PROBLEM TO BE SOLVED: To deposit an oxide film at higher film deposition rate also with high adhesive strength when a composite film obtained by depositing the oxide film on a nitride film or the like by PVD (Physical Vapor Deposition) is applied to the surface of a substrate. SOLUTION: A substrate 3, a cathode 5 for depositing a nitride film or the like, and a cathode 6 for depositing an oxide film are stored in the inside of a chamber 1. The inside of the chamber 1 is made into a nitrogen atmosphere, and the nitride film or the like are deposited on the surface of the substrate 3 by the cathode 5 for depositing the nitride film or the like. Next, in a state where the space between the cathode 6 for depositing an oxide film and the substrate 3 is shielded with a shutter 7, the inside of the chamber 1 is made into an oxygen atmosphere, and the surface of the cathode 6 for depositing the oxide film is coated with an oxide. Thereafter, the shutter 7 is opened to deposit the oxide film on the surface of the nitride film or the like by the cathode 6 for depositing the oxide film. COPYRIGHT: (C)2005,JPO&NCIPI
|
