发明名称 LITHOGRAPHIC APPARATUS, METHOD FOR FABRICATING DEVICE, AND DEVICE FABRICATED THROUGH PROCESS
摘要 PROBLEM TO BE SOLVED: To obtain a lithographic system in which dispersive heat generation is reduced by suppressing an eddy current being induced in the cooling element of a Lorentz actuator for moving a substrate or a mask, and performance and reliability of the actuator are prevented from lowering. SOLUTION: One or more slits 7 made in the cooling element 1 of a Lorentz actuator act as a barrier of eddy current being induced and since electric resistance of an eddy current passage increases, quantity of eddy current is reduced thus lowering the level of damping force and dispersive heat generation. These slits are preferably arranged perpendicularly to an electric field being induced and substantially in parallel with each other. A cooling water channel may be combined with these channels in such a manner as a plurality of parallel passages are formed to reduce the flow impedance of coolant. The lowering of performance is prevented through reduction in heat generation and since a fragile material, e.g. ceramic, is not required, the lowering of reliability is also prevented. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004343067(A) 申请公布日期 2004.12.02
申请号 JP20040067421 申请日期 2004.03.10
申请人 ASML NETHERLANDS BV 发明人 HOL SVEN ANTOIN JOHAN;BUIJS EDWIN JOHAN;VAN DER SCHOOT HARMEN KLAAS;VREUGDEWATER PATRICIA
分类号 H01L21/027;G03F7/20;H02K9/22;H02K41/02;H02K41/03;H02K41/035;(IPC1-7):H01L21/027 主分类号 H01L21/027
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