发明名称 VAPOR DEPOSITING APPARATUS OF PDP, AND VAPOR DEPOSITING METHOD OF PDP
摘要 PROBLEM TO BE SOLVED: To strike a balance between quality stability and mass-production efficiency when multiple kinds of materials are selectively used. SOLUTION: A vapor depositing apparatus of a PDP comprises a first container 1 for filling up a first vapor depositing material 4; a second container 1 for filling up a second vapor depositing material 4; a first electron beam generator 3 for irradiating a first electron beam A to the first material 4; and a second electron beam generator 3 for irradiating a second electron beam B to the second material 4. The second electron beam B is not irradiated to the second material 4 during the irradiation of the first electron beam A to the first material 4. The second electron beam B is projected to the second material 4, when a first process for vapor depositing the first material 4 is finished, and a second process for vapor depositing the second material 4 is started. A vacuum chamber is kept closed as it is during a shift period shifting from the first process to the second process, and the first material 4 is not exchanged with the second material 4. Two kinds of vapor depositing materials are kept in the same vacuum environment, and a material environment in the vacuum chamber is kept constant while the process is shifting, and the quality of a vapor depositing layer is kept uniform in quality and the mass-production efficiency is improved. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004342343(A) 申请公布日期 2004.12.02
申请号 JP20030134073 申请日期 2003.05.13
申请人 NEC PLASMA DISPLAY CORP 发明人 FUKUHARA HIRONORI
分类号 H01J9/02;H01J11/22;H01J11/34;H01J11/40;(IPC1-7):H01J9/02;H01J11/02 主分类号 H01J9/02
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