Cleaning agent including a corrosion inhibitor used in a process of forming a semiconductor device

摘要

A cleaning solution having a corrosion inhibitor and a surfactant is disclosed. The corrosion inhibitor is represented by formula 1 and the surfactant is represented by the formula 2 as follows: R1-R2-C=C-R3-R4 <Formula 1> R5-(CH2)K-A <Formula 2> In formula 1, any one of R1 and R4 is a hydroxyl group (-OH) and the other is hydrogen (-H), a halogen element (-X) or one functional group selected from the group consisting of alkyl (-R) group, alkoxy (RO-) group, amino (-NH2) group, nitro (-NO2) group, mercapto (-SH) group, hydroxyl (-OH) group, aldehyde (-CHO) group and carboxyl (-COOH) group. R2 and R3 are hydrocarbons having 0 to 10 carbons including a straight or a branched structure. In formula 2, R5 is methyl group and K is an integer ranging from 3 to 22. A is HO(CH2CH2O)L(CH(CH3)CH2O)M or hydroxyl group, and L and M are integers ranging from 0 to 15.