发明名称 |
Mask, mask blank, photosensitive film therefor and fabrication thereof |
摘要 |
Disclosed are masks and mask blanks for photolithographic processes, photosensitive films and fabrication method therefor. Photosensitive films are deposited on a substrate in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern depth. The masks may have features above the surface formed from opaque or attenuating materials. Boro-germano-silicate photosensitive films having a composition consisting essentially, in terms of mole percentage, of: 0-20% of B2O3, 5-25% of GeO2 and the remainder SiO2 can be used for the film. The film is advantageously deposited by using PECVD wherein tetramethoxygermane is used as the germanium source.
|
申请公布号 |
US2004241556(A1) |
申请公布日期 |
2004.12.02 |
申请号 |
US20030448681 |
申请日期 |
2003.05.29 |
申请人 |
BELLMAN ROBERT A.;BORRELLI NICHOLAS F.;WALTON ROBIN M. |
发明人 |
BELLMAN ROBERT A.;BORRELLI NICHOLAS F.;WALTON ROBIN M. |
分类号 |
C03C17/02;C03C23/00;G03F1/00;G03F1/14;(IPC1-7):G03C5/00;B32B9/00;G03F9/00;B32B17/06 |
主分类号 |
C03C17/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|