发明名称 |
FET FOR LARGE CURRENT AMPLIFICATION USING INSULATOR-SEMICONDUCTOR PHASE TRANSITION MATERIAL LAYER AS CHANNEL SUBSTANCE AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: An FET(Field Effect Transistor) and a manufacturing method thereof are provided to obtain large current amplification at a low gate voltage and a low source-drain voltage by using an insulator-semiconductor phase transition material layer as channel substance. CONSTITUTION: An insulator-semiconductor phase transition material layer(120) is formed on a substrate(110). A first state of few hole charges and a second state of a lot of hole charges are selectively obtained for the material layer according to the value of a gate voltage. A gate insulating layer(150) is formed on the material layer. A gate electrode(160) is formed on the gate insulating layer. When the gate electrode applies a predetermined negative voltage to the material layer, a lot of hole charges flow into a surface of the material layer. A source(130) and a drain(140) are formed at both sides of the material layer to flow carriers through the material layer in the second state. At this time, the material layer is used as a conductive channel. The material layer is made of VO2.
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申请公布号 |
KR20040099797(A) |
申请公布日期 |
2004.12.02 |
申请号 |
KR20030031903 |
申请日期 |
2003.05.20 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
CHAE, BYEONG GYU;KANG, GWANG YONG;KIM, HYEON TAK;YOON, DU HYEOP |
分类号 |
H01L21/316;H01L29/772;H01L49/00;H01L51/05;H01L51/30;(IPC1-7):H01L29/772 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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