发明名称 |
System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanism |
摘要 |
A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.
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申请公布号 |
US2004239283(A1) |
申请公布日期 |
2004.12.02 |
申请号 |
US20030449001 |
申请日期 |
2003.06.02 |
申请人 |
ASML HOLDING N.V. |
发明人 |
GALBURT DANIEL N.;CARTER FREDERICK M.;ROUX STEPHEN |
分类号 |
G03F7/20;G03B27/42;G03B27/72;G05B11/32;H01L21/027;(IPC1-7):G05B11/32 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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