| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a power supply device which can impress a required high voltages to a plurality of plasma generators, and an exhaust gas purification system which can be inexpensively and compactly constituted. <P>SOLUTION: The power supply device 30 for generating plasma impresses the high voltages to a plurality of plasma reactors 10 and 20. It includes a first transformer 33 and a second transformer 38. A primary coil of the first transformer 33 is connected to a primary power supply 31 via an inverter circuit 32 controlled by a controller 35. A secondary coil of the transformer 33 is connected to the first plasma reactor 10. A primary coil of the second transformer 38 is connected to the secondary coil of the first transformer 33. A secondary coil of the transformer 38 is connected to the second plasma reactor 20. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
