INORGANIC MATERIAL LAYER USING PHOTOSENSITIVE COMPOSITION CONTAINING AT LEAST TWO KINDS OF DIFFERENT INORGANIC POWDERS HAVING DIFFERENT AVERAGE DIAMETER AND SOFTENING POINT, INORGANIC MATERIAL LAYER STRUCTURE USING THE INORGANIC MATERIAL LAYER, PREPARATION METHOD THEREOF AND TRANSFER FILM USING THE PHOTOSENSITIVE COMPOSITION

摘要

PURPOSE: Provided are an inorganic material layer which has a low dielectric constant and a highly precise microstructure and is almost free from the change of line width or layer thickness of a pattern of partition walls or dielectrics after sintering, an inorganic material layer structure using the inorganic material layer, its preparation method and a transfer film. CONSTITUTION: The inorganic material layer is a porous inorganic material layer obtained by sintering a photosensitive composition containing at least an inorganic powder, wherein the inorganic material layer has a pore area rate of 5-75 % and a pore size of 0.1-30 micrometers. Preferably the photosensitive composition comprises a hydrophilic group-substituted or unsubstituted cellulose derivative, a sensitizer, and a radiation curing agent. Preferably the inorganic powder comprises at least two kinds of inorganic powders whose an average diameter and a softening point are in a high rank, and the powder with a large average diameter has a higher softening point.