EXPOSURE APPARATUS OF SEMICONDUCTOR MANUFACTURING EQUIPMENT FOR MINIMIZING LIGHT SCATTERING CAUSED BY CHEMICAL PARTICLES ON LENS

摘要

PURPOSE: An exposure apparatus of semiconductor manufacturing equipment is provided to prevent the pollution of a lens and to minimize the scattering of light caused by the pollution by forming a fluid between a wafer and the lens. CONSTITUTION: An exposure apparatus includes a lens part(12) and a fluid part. The fluid(13) is located between the lens part and a wafer. The fluid surrounds the lens part to separate the lens from the ambient. The fluid is used for increasing the transmittance of DUV(Deep UltraViolet) rays and minimizing the scattering of the DUV rays. The fluid is water or air.