发明名称 STAGE APPARATUS AND APPARATUS AND METHOD FOR APPLYING PASTE BY USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a stage apparatus by which a liquid crystal substrate can be prevented from being warped by its own weight or its own warp can be corrected in a paste applying apparatus to be adopted when the liquid crystal substrate is assembled. SOLUTION: This stage apparatus has a receiving surface 4A3 on which the substrate 2 to be held and carried in on a conveying arm 3 is placed and an approach space 4A2 which is formed below the surface 4A3 and into which a substrate holding part of the arm 3 for holding the substrate 2 can go. A movable supporting pin 10 is arranged in the space 4A2 so that the pin 10 is located at the position that the pin 10 is retreated from the approach route of the substrate holding part when the substrate holding part of the arm 3 goes into the space 4A2 and located at the height almost similar to that of the surface 4A3 to support the substrate 2 from below when the substrate holding part is retreated from the space 4A2. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004337744(A) 申请公布日期 2004.12.02
申请号 JP20030138038 申请日期 2003.05.16
申请人 SHIBAURA MECHATRONICS CORP 发明人 KOJIMA JUNICHI
分类号 G02F1/13;B05C5/00;B05C13/02;B05D1/26;B05D3/00;(IPC1-7):B05C13/02 主分类号 G02F1/13
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