发明名称 Method of manufacture of a PCRAM memory cell
摘要 The invention provides a method of forming a resistance variable memory element and the resulting element. The method includes forming an insulating layer having an opening therein; forming a metal containing layer recessed in the opening; forming a resistance variable material in the opening and over the metal containing layer; and processing the resistance variable material and metal containing layer to produce a resistance variable material containing a diffused metal within the opening.
申请公布号 US2004238918(A1) 申请公布日期 2004.12.02
申请号 US20040886676 申请日期 2004.07.09
申请人 MOORE JOHN T.;CAMPBELL KRISTY A.;GILTON TERRY L. 发明人 MOORE JOHN T.;CAMPBELL KRISTY A.;GILTON TERRY L.
分类号 H01L21/20;H01L21/336;H01L21/8234;H01L21/8244;H01L27/24;H01L29/00;H01L45/00;(IPC1-7):H01L21/823;H01L21/824 主分类号 H01L21/20
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