发明名称 |
LITHOGRAPHIC METHOD FOR SMALL LINE PRINTING |
摘要 |
The minimal feature width (CD) of a pattern of device features configured in a substrate layer by means of a lithographic process can be reduced considerably, without reducing process latitudes (DOF), by substantially extending the post-exposure bake step and reducing the exposure dose. By the same measures the isofocal CD can be tuned to the design CD so that for an arbitrary CD process latitudes are enlarged. |
申请公布号 |
WO2004021088(A3) |
申请公布日期 |
2004.12.02 |
申请号 |
WO2003IB03663 |
申请日期 |
2003.08.18 |
申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V.;VAN STEENWINKEL, DAVID;LAMMERS, JEROEN, H. |
发明人 |
VAN STEENWINKEL, DAVID;LAMMERS, JEROEN, H. |
分类号 |
G03F7/039;G03F7/038;G03F7/20;G03F7/38;G03F7/40;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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