发明名称 |
Surface treatment method e.g. for flat substrates and circuit-boards, involves treating surface with air-ionization by electrical discharge at high-voltage |
摘要 |
<p>A method for treating/processing the surface of a flat substrate (20) for removing impurities from the surface or for improving the surface wetting properties of the surface. The surface is treated with air-ionization (22) by electrical discharge at high-voltage (HV) between at least one electrode (13) and at least one counter-electrode (16). INDEPENDNET CLAIMS are included for (a) a device for treating the surface of a substrate and for (b) application of an air-ionization device.</p> |
申请公布号 |
DE10321889(A1) |
申请公布日期 |
2004.12.02 |
申请号 |
DE2003121889 |
申请日期 |
2003.05.07 |
申请人 |
GEBR. SCHMID GMBH & CO. |
发明人 |
SCHMID, CHRISTIAN |
分类号 |
B08B6/00;B08B7/00;H05K3/00;(IPC1-7):B01J19/08;H05K3/26 |
主分类号 |
B08B6/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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