发明名称 Surface treatment method e.g. for flat substrates and circuit-boards, involves treating surface with air-ionization by electrical discharge at high-voltage
摘要 <p>A method for treating/processing the surface of a flat substrate (20) for removing impurities from the surface or for improving the surface wetting properties of the surface. The surface is treated with air-ionization (22) by electrical discharge at high-voltage (HV) between at least one electrode (13) and at least one counter-electrode (16). INDEPENDNET CLAIMS are included for (a) a device for treating the surface of a substrate and for (b) application of an air-ionization device.</p>
申请公布号 DE10321889(A1) 申请公布日期 2004.12.02
申请号 DE2003121889 申请日期 2003.05.07
申请人 GEBR. SCHMID GMBH & CO. 发明人 SCHMID, CHRISTIAN
分类号 B08B6/00;B08B7/00;H05K3/00;(IPC1-7):B01J19/08;H05K3/26 主分类号 B08B6/00
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