发明名称 High density magnetoresistance memory and manufacturing method thereof
摘要 A high density magnetoresistance memory and a manufacturing method thereof are provided. The magnetoresistance memory includes: a memory cell storing information; a conductive line contacting the memory cell to change the magnetization direction of the memory cell by generating a magnetic field; and at least one flux concentrating island (FCI) located between the conductive line and the memory cell for concentrating flux onto the memory cell. The flux is concentrated onto the memory cell to reduce a required electric current and improve selectivity, thereby forming a high-density and highly integrated memory cell.
申请公布号 US2004240267(A1) 申请公布日期 2004.12.02
申请号 US20030714609 申请日期 2003.11.18
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM EUN-SIK;KIM YONG-SU
分类号 H01L27/105;G11C11/15;G11C11/16;H01L21/8246;H01L43/08;(IPC1-7):G11C11/15 主分类号 H01L27/105
代理机构 代理人
主权项
地址