LAYER SYSTEM COMPRISING A SILICON LAYER AND A PASSIVATION LAYER, METHOD FOR PRODUCING A PASSIVATION LAYER ON A SILICON LAYER AND THE USE OF SAID SYSTEM AND METHOD

摘要

The invention relates to a layer system comprising a silicon layer (11), at least some sections of whose surface are provided with a passivation layer (17), the latter (17) consisting of a first, at least predominantly inorganic sub-layer (14) and a second sub-layer (15). The latter (15) is composed of an organic compound comprising silicon or a similar material. The second sub-layer (15) in particular takes the form of a self-assembled monolayer. The invention also relates to a method for producing a passivation layer (17) on a silicon layer (11), whereby a first inorganic sub-layer (14) is produced on said layer (11) and a second sub-layer (15), containing an organic compound containing silicon or consisting of said compound, is produced on at least some sections of the first sub-layer (14), whereby the sub-layers form the passivation layer (17). The inventive layer system or the inventive method are particularly suitable for producing cantilever structures in silicon.