LITHOGRAPHIC PROJECTION APPARATUS CAPABLE OF TRANSFERRING EFFICIENTLY WAFER AND METHOD OF MANUFACTURING DEVICE

摘要

PURPOSE: A lithographic projection apparatus and a method of manufacturing device are provided to transfer efficiently a wafer between a lithography patterning chamber and second surroundings through a loadlock without one or more out of particles, oxygen, hydrocarbon and/or H2O. CONSTITUTION: A lithographic projection apparatus includes a radiation system and a loadlock(LL). The radiation system includes a support structure, a substrate table, and a lithography patterning chamber(PC). The loadlock is used for transferring a wafer(W) between the lithography patterning chamber and second surroundings. The loadlock includes a chamber, a first door(11) facing the lithography patterning chamber, a second door(12) facing the second surroundings, and a gas inlet port(13). A gas supply part(17) for providing predetermined gas without one or more out of particles, oxygen, hydrocarbon and/or H2O is connected with the gas inlet port.