| 摘要 |
<p>Lithographic projection apparatus includes a masking device having two masking mechanisms disposed in the vicinity of the focal plane in a mechanically uncoupled arrangement with respect to each other. Lithographic projection apparatus comprises an illumination system for providing a projection beam of radiation. The illumination system defines a focal plane through which the projection beam passes. A support structure supports a patterning mechanism serving to pattern the projection beam according to a desired pattern. A masking device obscures part of the patterning mechanism from the projection beam and the patterned beam. It comprises a first masking mechanism arranged to obscure the part in a first direction with respect to the location where the patterning mechanism is supported and a second masking mechanism arranged to obscure part of the location in a second different direction with respect to the location. A substrate table holds a substrate. A projection system images the patterned beam onto a target portion of the substrate. The first and second masking mechanisms are disposed in the vicinity of the focal plane in a mechanically uncoupled arrangement with respect to each other. Independent claims are also included for: (1) a method of manufacturing the above lithographic projection apparatus; (2) masking device; and (3) masking plate comprising a composition including chemical vapor deposition diamond, tungsten copper alloy or silicon carbide.</p> |
