| 摘要 |
<p>Photosensitive resin composition contains an alkali-soluble acrylic resin, quinone-diazide group-containing photosensitizer and a solvent which is a mixture of propylene glycol monomethyl ether acetate (A) and a solvent whose vapor pressure under normal pressure is less than that of (A). The composition contains a phenolic compound. Photosensitive resin composition contains an alkali-soluble acrylic resin, quinone-diazide group-containing photosensitizer and a solvent which is a mixture of propylene glycol monomethyl ether acetate (A) and a solvent whose vapor pressure under normal pressure is less than that of (A). The composition contains a phenolic compound of formula (I). [Image] R1- R7H, 1-4C alkyl of a group of formula (Ia); m and n : 0-2; a, b, c, d, e, f and g : 0-5 where a + b = 5, c + d = 5, e + f = 5 and g + h = 5; i : 0-2.</p> |
