发明名称 System and method for producing gray scaling using multiple spatial light modulators in a maskless lithography system
摘要 <p>The method involves illuminating light onto an array of reflective spatial light modulators (104) e.g. reflective LCD. The spatial light modulators pattern the light to produce an exposure light pattern having spatially varying intensities. The patterned light is written onto an object (112) e.g. substrate, to produce gray scaled patterns on the object based on the spatially varying light intensities. An independent claim is also included for a maskless lithography system for producing gray scale patterns on objects.</p>
申请公布号 EP1482367(A2) 申请公布日期 2004.12.01
申请号 EP20040012133 申请日期 2004.05.21
申请人 ASML HOLDING N.V. 发明人 WASSERMAN, SOLOMON S.;CEBUHAR, WENCESLAO A.;HINTERSTEINER, JASON D.;VOLPE, GERALD T.
分类号 G03F7/20;H01L21/027;(IPC1-7):G03F7/20 主分类号 G03F7/20
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