发明名称 Exposure apparatus and device fabrication method
摘要 <p>The apparatus has an illumination optical system to illuminate a pattern on an object with light supplied from a semiconductor laser light source (1a). A projection optical system projects an image of the pattern onto a plate. A photosensor (4a) detects a positional offset of the pattern image. A mirror drive (6) inclines a mirror (M2), and moves the mirror by a minute amount in an optical-axis direction based on the offset. An independent claim is also included for a device fabrication method.</p>
申请公布号 EP1482368(A2) 申请公布日期 2004.12.01
申请号 EP20040012646 申请日期 2004.05.27
申请人 CANON KABUSHIKI KAISHA 发明人 SUZUKI, MASAYUKI
分类号 G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址