CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a chemical amplification type positive resist composition containing a resin component and an acid generator, suitable for lithography using an excimer laser such as ArF or KrF, excellent in performance balance of resolution and sensitivity and ensuring a small reduction in size in SEM observation. SOLUTION: The chemical amplification type positive resist composition contains an alkali-insoluble resin having a polymerization unit derived from a monomer of formula (I) (where R1 and R2 are each H or methyl) and made alkali-soluble by the action of an acid and an acid generator.