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发明名称
微影用光罩护层及其制作方法
摘要
本发明旨在提供一种较大尺寸之微影用光罩护层及其制作方法,相较于知之旋转涂布法,可以更简单且确实地制作既价廉又大型之光罩护层,其具有膜厚不均现象较少、光线透过率均匀且较高的优点。本发明之微影用光罩护层,至少具有:a)光罩护层膜,阻挡异物用;b)光罩护层框,黏贴该光罩护层膜;c)黏接剂层,为了黏贴光罩护层膜而设置于光罩护层框之一边端面;d)黏附层,设置于光罩护层框之另一边端面;其特征为:该光罩护层膜系利用金属模涂布机而形成的。
申请公布号
TW200407663
申请公布日期
2004.05.16
申请号
TW092130995
申请日期
2003.11.05
申请人
信越化学工业股份有限公司
发明人
永田爱彦
分类号
G03F1/14
主分类号
G03F1/14
代理机构
代理人
周良谋
主权项
地址
日本
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