发明名称 Process for improving adhesion of resistive foil to laminating materials
摘要 The invention relates to a process to enhance adhesion of resistive foil to laminating materials, including: providing a copper foil; depositing at least one resistive metal layer on at least one side of the copper foil; and applying at least one layer of at least one adhesion-promoting material over and adhered to the resistive metal layer, the adhesion-promoting material being suitable for enhancing adhesion between the resistive metal layer and laminating materials. The resistive metal layer may include NiCr, NiCrAlSi, aluminum, nickel, zinc, titanium, vanadium, chromium, manganese, iron, tantalum, molybdenum, ruthenium, and alloys, oxides, nitrides and silicides thereof. The invention further relates to a multilayer foil and to a laminate, both including the resistive metal layer and adhesion-promoting material.
申请公布号 US6824880(B1) 申请公布日期 2004.11.30
申请号 US20030439124 申请日期 2003.05.15
申请人 GA-TEK, INC. 发明人 ADMASU ATNAF;WANG JIANGTAO;CLOUSER SIDNEY
分类号 C23C26/00;C23C28/00;H01C17/07;H01C17/28;H05K1/16;H05K3/38;(IPC1-7):B32B15/04 主分类号 C23C26/00
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