发明名称 Silicon crystallization method
摘要 Sequential lateral solidification (SLS) crystallization of amorphous silicon using a mask having striped light transmitting portions. An amorphous silicon bearing substrate is located in an SLS apparatus. The amorphous silicon film is functionally divided into a driving region (for driving devices) and a display region (for TFT switches). Part of the driving region is crystallized by a laser that passes through the mask. The mask is then moved relative to the substrate by a translation distance that is less than half the width of the light transmitting portions. Thereafter, subsequent crystallizations are performed to crystallize the driving region. Then, part of the display region is crystallized by a laser that passes through the mask. The mask is then moved relative to the substrate by a translation distance that is more than half the width of the light transmitting portions. Thereafter, subsequent crystallizations are performed to crystallize the display region.
申请公布号 US6825493(B2) 申请公布日期 2004.11.30
申请号 US20020163419 申请日期 2002.06.07
申请人 LG.PHILIPS LCD CO., LTD. 发明人 JUNG YUN-HO
分类号 H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L29/04;H01L31/036 主分类号 H01L21/20
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