APPARATUS FOR DETECTING PARTICLES ON RETICLE TO REMARKABLY IMPROVE PRECISION AND RESOLUTION

摘要

PURPOSE: An apparatus for detecting particles on a reticle is provided to remarkably improve precision and resolution by efficiently and precisely controlling the existence of particles that exist on a reticle and disturb formation of a pattern while using an elliptic spectroscope. CONSTITUTION: A system light source(1) is prepared. A lens(2) focuses the light of the light source. The light focused from the lens passes through a slit(3). A polarizer(4) is positioned under the slit. The first reflection mirror(5) changes the path of light to make the light passing through the structure incident upon the surface of a reticle(12). The second reflection mirror changes the path of the light that is reflected from the surface of the reticle wherein the light path is changed by the first reflection mirror. The light reflected from the second reflection mirror is incident upon an analyzer(8). A two-dimensional PSD(position sensitive detector)(9) reduces the error of an optical automatic focus apparatus. A detector detects the information related to the light.