发明名称 |
Resin useful for resist, resist composition and pattern forming process using the same |
摘要 |
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
|
申请公布号 |
US6824957(B2) |
申请公布日期 |
2004.11.30 |
申请号 |
US20030635571 |
申请日期 |
2003.08.07 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
OKINO TAKESHI;ASAKAWA KOJI;SHIDA NAOMI;USHIROGOUCHI TORU;SAITO SATOSHI |
分类号 |
G03F7/038;G03F7/039;(IPC1-7):G03F7/20;G03F7/40;G03C7/30 |
主分类号 |
G03F7/038 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|