| 摘要 |
PROBLEM TO BE SOLVED: To provide a method useful for producing an alumina film consisting mainly of anαtype crystal structure where an oxidization stage can be performed at a relatively low temperature in a short period of time without limiting an intermediate layer to metallic elements forming oxide having a specified lattice constant structure. SOLUTION: In the method of producing an alumina film consisting mainly of anαtype crystal structure on a base material, at least one film selected from the following (a) to (c) is formed before an alumina film formation stage, thereafter, the surface is subjected to oxidization treatment, and subsequently, an alumina film is formed: (a) is a film consisting of pure metal or alloy; (b) is a film consisting mainly of metal allowing nitrogen, oxygen carbon or boron to enter into solid solution; and (c) is a film consisting of metal nitride, oxide, carbide or boride comprising nitrogen, oxygen carbon or boron insufficient for the stoichiometric composition. COPYRIGHT: (C)2005,JPO&NCIPI
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