| 摘要 |
PROBLEM TO BE SOLVED: To provide an alumina film with anαtype crystal structure which does not substantially containγalumina causing cracks when applied to a cutting tool or the like and used at a high temperature. SOLUTION: The alumina film is formed on a base material (including the one obtained by previously forming a substrate film on a base material) by a physical vapor deposition method. When the crystal structure of the alumina film is observed with a cross-sectional transmission electron microscope (magnification: 20,000 times), at least the film growth starting part is composed of alumina crystals with a fine structure, and crystal structures other than theαtype crystal structure are not substantially observed in the fine crystal region. COPYRIGHT: (C)2005,JPO&NCIPI
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