发明名称 |
BISMUTH SUBSTITUTION TYPE MAGNETIC GARNET FILM AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a bismuth substitution type magnetic garnet film having a high extinction ratio which is grown by a liquid phase epitaxial method, and to provide a method for manufacturing the same by which the film can be obtained with a high yield. SOLUTION: In the method for manufacturing the bismuth substitution type magnetic garnet film by the liquid phase epitaxial method using a non-magnetic garnet substrate, YbTbBiFe-based magnetic garnet film or the like having a thickness of≥1,000μm is manufactured. In the bismuth substitution type magnetic garnet films such as the YbTbBiFe-based magnetic garnet film manufactured by the method, the difference between lattice constants at the surface and the rear surface is≤0.0002 nm and the extinction ratio is≥45 dB. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004331454(A) |
申请公布日期 |
2004.11.25 |
申请号 |
JP20030129834 |
申请日期 |
2003.05.08 |
申请人 |
SUMITOMO METAL MINING CO LTD |
发明人 |
IINO TAKAYUKI;SASAKI TATSUYA;OYAMA HIROSHI |
分类号 |
C30B29/28;C30B19/12;H01F10/12;H01F41/28;(IPC1-7):C30B29/28 |
主分类号 |
C30B29/28 |
代理机构 |
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