发明名称 BISMUTH SUBSTITUTION TYPE MAGNETIC GARNET FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a bismuth substitution type magnetic garnet film having a high extinction ratio which is grown by a liquid phase epitaxial method, and to provide a method for manufacturing the same by which the film can be obtained with a high yield. SOLUTION: In the method for manufacturing the bismuth substitution type magnetic garnet film by the liquid phase epitaxial method using a non-magnetic garnet substrate, YbTbBiFe-based magnetic garnet film or the like having a thickness of≥1,000μm is manufactured. In the bismuth substitution type magnetic garnet films such as the YbTbBiFe-based magnetic garnet film manufactured by the method, the difference between lattice constants at the surface and the rear surface is≤0.0002 nm and the extinction ratio is≥45 dB. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004331454(A) 申请公布日期 2004.11.25
申请号 JP20030129834 申请日期 2003.05.08
申请人 SUMITOMO METAL MINING CO LTD 发明人 IINO TAKAYUKI;SASAKI TATSUYA;OYAMA HIROSHI
分类号 C30B29/28;C30B19/12;H01F10/12;H01F41/28;(IPC1-7):C30B29/28 主分类号 C30B29/28
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