发明名称 |
Multi-layer mirror for radiation in the xuv wavelenght range and method for manufacture thereof |
摘要 |
Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.
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申请公布号 |
US2004233519(A1) |
申请公布日期 |
2004.11.25 |
申请号 |
US20040477393 |
申请日期 |
2004.05.21 |
申请人 |
BIJKERK FREDERIK;LOUIS ERIC;KESSELS MARCUS JOSEF HENRICUS;VERHOEVEN JAN;DEN HARTOG MARKUS JOHANNES HARMEN |
发明人 |
BIJKERK FREDERIK;LOUIS ERIC;KESSELS MARCUS JOSEF HENRICUS;VERHOEVEN JAN;DEN HARTOG MARKUS JOHANNES HARMEN |
分类号 |
G21K1/06;(IPC1-7):G02B5/08 |
主分类号 |
G21K1/06 |
代理机构 |
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地址 |
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