发明名称 |
Gas-shield electron-beam gun for thin-film curing application |
摘要 |
An electron-beam irradiation apparatus includes an evacuatable filament-electron gun chamber housing a filament and an anode and having an inactive-gas inlet through which an inactive gas flows in; an evacuatable treatment chamber connected to an exhaust system; and a separation wall for separating the filament-electrode gun chamber and the treatment chamber. The separation wall has an aperture configured to pass electrons and gas therethrough from the filament-electron gun chamber.
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申请公布号 |
US2004232355(A1) |
申请公布日期 |
2004.11.25 |
申请号 |
US20040847127 |
申请日期 |
2004.05.17 |
申请人 |
ASM JAPAN K.K. |
发明人 |
MATSUKI NOBUO;FUKAZAWA ATSUKI;TSUJI NAOTO |
分类号 |
H01J33/00;H01J37/06;(IPC1-7):H01J37/32 |
主分类号 |
H01J33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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