发明名称 Gas-shield electron-beam gun for thin-film curing application
摘要 An electron-beam irradiation apparatus includes an evacuatable filament-electron gun chamber housing a filament and an anode and having an inactive-gas inlet through which an inactive gas flows in; an evacuatable treatment chamber connected to an exhaust system; and a separation wall for separating the filament-electrode gun chamber and the treatment chamber. The separation wall has an aperture configured to pass electrons and gas therethrough from the filament-electron gun chamber.
申请公布号 US2004232355(A1) 申请公布日期 2004.11.25
申请号 US20040847127 申请日期 2004.05.17
申请人 ASM JAPAN K.K. 发明人 MATSUKI NOBUO;FUKAZAWA ATSUKI;TSUJI NAOTO
分类号 H01J33/00;H01J37/06;(IPC1-7):H01J37/32 主分类号 H01J33/00
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