发明名称 PATTERN DRAWING DEVICE GENERATING CONTROL SIGNAL FOR BEAM SCANNING
摘要 <P>PROBLEM TO BE SOLVED: To make quickly, efficiently and accurately formable a pattern according to the scanning speed characteristic of a beam. <P>SOLUTION: The pattern drawing device is constituted so that a series of small sections is previously set in a scanning line, the scanning time interval necessary for respective small sections ADj is set to measure the error of the scanning time with respect to a preset reference scanning time interval by an error measurement part 91, and the reference scanning time interval (reference counting pulse number K) is corrected on the basis of the error of the scanning time by a time interval measurement part 94. A pulse data selection part 96 selects a pulse data corresponding to the corrected scanning time interval from a series of pulse data, and a control pulse signal generation part 98 generates a control pulse signal for synchronization on the basis of the selected pulse data. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004333874(A) 申请公布日期 2004.11.25
申请号 JP20030129749 申请日期 2003.05.08
申请人 PENTAX CORP 发明人 OKUYAMA TAKASHI
分类号 B41J2/44;G02B26/10;G03F7/20;H01L21/027 主分类号 B41J2/44
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