PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM RESIST WITH FAVORABLE STORAGE STABILITY, AND USE METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition and a photosensitive dry film having excellent storage stability, being developable with an aqueous solution, having high adhesion property, resulting a favorable pattern and showing little change in the solubility in an alkali with time, and to provide the use method thereof.

SOLUTION: The photosensitive composition contains: (A) soluble polyimide having a carboxyl group and/or a hydroxyl group; (B) a (meth)acrylic compound; (C) an epoxy compound; and (D) a latent hardening agent. The photosensitive dry film resist is produced from the composition. The use method thereof is also presented.

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