| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable the adjustment of the distribution of plasma density. <P>SOLUTION: This plasma treatment apparatus is provide with a susceptor 2 having a mounting surface on which an object W to be treated is arranged, a vessel 1 which accommodates the susceptor 2 and has an opening at a side facing the mounting surface of the susceptor 2, a dielectric board 7 which closes the opening of the vessel 1, and an electromagnetic field feeder 10 which feeds a high frequency electromagnetic field to the inside of the vessel 1 through the dielectrics board 7. The electromagnetic field feeder 10 is provided with an antenna 20 which is arranged facing the dielectrics board 7, and a projection 31A which is protruded toward the dielectric board 7 from the surface 24A of the antenna 20. The projection 31A has conductivity at least on the surface. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
