METHOD OF OPTICAL PROXIMITY EFFECT CORRECTION

摘要

PROBLEM TO BE SOLVED: To provide a method of proper optical proximity effect correction for an entire circuit pattern in which exposure deviation caused by inhomogeneous pattern density in a local region of a photomask is not taken into consideration.

SOLUTION: A circuit pattern to be transferred onto a substrate is corrected by using a computer system, and a plurality of dummy patterns not to be developed is formed in a vacant region except the circuit pattern. The circuit pattern and the dummy pattern not to be developed are produced together on the top face of a substrate.

COPYRIGHT: (C)2005,JPO&NCIPI