| 摘要 |
PROBLEM TO BE SOLVED: To provide a weight-reduced aligner having a stage system that can make highly accurate scanning and positioning. SOLUTION: In the reticle chamber 111 of this aligner 101, the bending force caused by the deformation of a main body 103 when the atmospheric pressure is reduced can be relieved through the spherical bearings of three legs 115a provided on the bottom surface side of a reticle stool 115 and, in addition, can be adjusted by actuating an adjusting mechanism 115X. In the wafer chamber 131 of this aligner 101, similarly, the bending force caused by the deformation of the bottom of the chamber 131 when the atmospheric pressure is reduced can be suppressed by the compressive deformation of a pan 133 provided under the bottom of the chamber 131, can be relieved through the spherical bearings 135a of three legs 135a provided on the bottom surface side of a wafer stool 135, and can be adjusted by actuating an adjusting mechanism 135X. Consequently, the lowering of the exposure accuracy of this exposure device 101 can be suppressed and the throughput of this device 101 can be improved, because the deterioration etc., of the scannability of stages 117 and 137 caused by a reduction in atmospheric pressure can be avoided. COPYRIGHT: (C)2005,JPO&NCIPI |
