| 摘要 |
A mask unit is formed by providing a pattern forming mask disposed in close contact with the top face of a substrate held on a substrate holder and having prescribed pattern openings, and a shielding mask having pattern openings larger by prescribed dimension than the pattern openings in this pattern forming mask. The pattern forming mask and the shielding mask are held on the substrate. A prescribed clearance is provided between the pattern forming mask and the shielding mask.
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