发明名称 |
ENVELOPE FOLLOWER END POINT DETECTION IN TIME DIVISION MULTIPLEXED PROCESSES |
摘要 |
The present invention provides a method and an apparatus for establishing endpoint during an alternating cyclical etch process or time division multiplexed process. A substrate is placed within a plasma chamber and subjected to an alternating cyclical process having an etching step and a deposition step. A variation in plasma emission intensity is monitored using known optical emission spectrometry techniques. An amplitude information is extracted from a complex waveform of the plasma emission intensity using an envelope follower algorithm. The alternating cyclical process is discontinued when endpoint is reached at a time that is based on the monitoring step. |
申请公布号 |
WO2004102642(A2) |
申请公布日期 |
2004.11.25 |
申请号 |
WO2004US14308 |
申请日期 |
2004.05.06 |
申请人 |
UNAXIS USA INC. |
发明人 |
WESTERMAN, RUSSELL;JOHNSON, DAVID |
分类号 |
G01L21/30;H01J37/32;H01L21/3065;H01L21/66 |
主分类号 |
G01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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